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衬底材料(Substruct)	（膜材料）Film material
	Dimeter（直径）	Type/dopant（类型/掺杂）	Orientaion	thickness（厚度）	Resistivity（电阻率）	（膜材料）Film material	thickness（厚度）	均匀度
单晶抛光硅片	25.4mm 50.8mm 76.5mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	400um+/-20 400um+/- 20 400um+/-20	0.0001 - 200 Ohm-cm /Customization	oxided layer	<100nm 100nm - 300nm >1000nm	<5%
100mm 125mm 150mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	525um+/-20 625um+/-20 625um+/-20	0.0001 - 200 Ohm-cm /Customization	oxided layer	<100nm 100nm - 300nm >1000nm	<5%
200mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	725um+/-20	0.0001 - 200 Ohm-cm /Customization	oxided layer	<100nm 100nm - 300nm >1000nm	<5%
300mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	775um+/-20	0.0001 - 200 Ohm-cm /Customization	oxided layer	<100nm 100nm - 300nm >1000nm	<5%
单晶抛光硅片	25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm 300mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	200um+/- 20 100um+/-20 customization	0.0001 - 200 Ohm-cm /Customization	Aluminum	<100nm 100nm - 300nm >1000nm	<5%
25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm 300mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	100um+/-20 200um+/- 20 customization	0.0001 - 200 Ohm-cm /Customization	Cu	<100nm 100nm - 300nm >1000nm	<5%
25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm 300mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	100um+/-20 200um+/- 20 customization	0.0001 - 200 Ohm-cm /Customization	Ag	<100nm 100nm - 300nm >1000nm	<5%
25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm 300mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	100um+/-20 200um+/- 20 customization	0.0001 - 200 Ohm-cm /Customization	Ti	<100nm 100nm - 300nm >1000nm	<5%
单晶蓝宝石晶片	25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm		C A M R or special orientation	1000um 2000um customization		GaN	500nm Customization	<5%
25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm		C A M R or special orientation	1000um 2000um customization		AlN	<100nm 300nm >1000nm	<5%
25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm		C A M R or special orientation	1000um 2000um customization		AlInN	<100nm 300nm >1000nm	<5%
25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm		C A M R or special orientation	1000um 2000um customization		Al	<100nm 300nm >1000nm	<5%
	25.4mm 50.8mm 76.5mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	400um+/-20 400um+/- 20 400um+/-20	0.0001 - 200 Ohm-cm /Customization	GaN	<100nm 300nm >1000nm	TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um
100mm 125mm 150mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	525um+/-20 625um+/-20 625um+/-20	0.0001 - 200 Ohm-cm /Customization	GaN	<100nm 300nm >1000nm	TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um
200mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	725um+/-20	0.0001 - 200 Ohm-cm /Customization	GaN	<100nm 300nm >1000nm	TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um
300mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	775um+/-20	0.0001 - 200 Ohm-cm /Customization	GaN	<100nm 300nm >1000nm	TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um
单晶砷化镓抛光晶片	50.8mm 76.5mm					AL
100mm 125mm					Cu
150mm					Au

单晶抛光硅片

25.4mm 50.8mm 76.5mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

400um+/-20 400um+/- 20 400um+/-20

0.0001 - 200 Ohm-cm /Customization

oxided layer

<100nm 100nm - 300nm >1000nm

<5%

100mm 125mm 150mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

525um+/-20 625um+/-20 625um+/-20

0.0001 - 200 Ohm-cm /Customization

oxided layer

<100nm 100nm - 300nm >1000nm

<5%

200mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

725um+/-20

0.0001 - 200 Ohm-cm /Customization

oxided layer

<100nm 100nm - 300nm >1000nm

<5%

300mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

775um+/-20

0.0001 - 200 Ohm-cm /Customization

oxided layer

<100nm 100nm - 300nm >1000nm

<5%

单晶抛光硅片

25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm 300mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

200um+/- 20 100um+/-20 customization

0.0001 - 200 Ohm-cm /Customization

Aluminum

<100nm 100nm - 300nm >1000nm

<5%

25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm 300mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

100um+/-20 200um+/- 20 customization

0.0001 - 200 Ohm-cm /Customization

Cu

<100nm 100nm - 300nm >1000nm

<5%

25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm 300mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

100um+/-20 200um+/- 20 customization

0.0001 - 200 Ohm-cm /Customization

Ag

<100nm 100nm - 300nm >1000nm

<5%

25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm 300mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

100um+/-20 200um+/- 20 customization

0.0001 - 200 Ohm-cm /Customization

Ti

<100nm 100nm - 300nm >1000nm

<5%

单晶蓝宝石晶片

25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm

C A M R or special orientation

1000um 2000um customization

GaN

500nm Customization

<5%

25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm

C A M R or special orientation

1000um 2000um customization

AlN

<100nm 300nm >1000nm

<5%

25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm

C A M R or special orientation

1000um 2000um customization

AlInN

<100nm 300nm >1000nm

<5%

25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm

C A M R or special orientation

1000um 2000um customization

Al

<100nm 300nm >1000nm

<5%

25.4mm 50.8mm 76.5mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

400um+/-20 400um+/- 20 400um+/-20

0.0001 - 200 Ohm-cm /Customization

GaN

<100nm 300nm >1000nm

TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um

100mm 125mm 150mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

525um+/-20 625um+/-20 625um+/-20

0.0001 - 200 Ohm-cm /Customization

GaN

<100nm 300nm >1000nm

TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um

200mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

725um+/-20

0.0001 - 200 Ohm-cm /Customization

GaN

<100nm 300nm >1000nm

TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um

300mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

775um+/-20

0.0001 - 200 Ohm-cm /Customization

GaN

<100nm 300nm >1000nm

TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um

单晶砷化镓抛光晶片

50.8mm 76.5mm

AL

100mm 125mm

Cu

150mm

Au

Film coating wafers

联系方式

Specification for Film Coating Wafer