Film coating wafers
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Specification for Film Coating Wafer
衬底材料(Substruct) | (膜材料)Film material | |||||||
---|---|---|---|---|---|---|---|---|
Dimeter(直径) | Type/dopant(类型/掺杂) |
Orientaion |
thickness(厚度) | Resistivity(电阻率) | (膜材料)Film material | thickness(厚度) | 均匀度 | |
单晶抛光硅片 | 25.4mm 50.8mm 76.5mm | P(Boron) N(Phos/As/Sb) | <100> <111> or special orientation |
400um+/-20 400um+/- 20 400um+/-20 | 0.0001 - 200 Ohm-cm /Customization |
oxided layer | <100nm 100nm - 300nm >1000nm | <5% |
100mm 125mm 150mm | P(Boron) N(Phos/As/Sb) | <100> <111> or special orientation | 525um+/-20 625um+/-20 625um+/-20 | 0.0001 - 200 Ohm-cm /Customization | oxided layer | <100nm 100nm - 300nm >1000nm | <5% | |
200mm | P(Boron) N(Phos/As/Sb) | <100> <111> or special orientation | 725um+/-20 | 0.0001 - 200 Ohm-cm /Customization | oxided layer | <100nm 100nm - 300nm >1000nm | <5% | |
300mm | P(Boron) N(Phos/As/Sb) | <100> <111> or special orientation | 775um+/-20 | 0.0001 - 200 Ohm-cm /Customization | oxided layer | <100nm 100nm - 300nm >1000nm | <5% | |
单晶抛光硅片 | 25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm 300mm | P(Boron) N(Phos/As/Sb) | <100> <111> or special orientation |
200um+/- 20 100um+/-20 customization | 0.0001 - 200 Ohm-cm /Customization |
Aluminum | <100nm 100nm - 300nm >1000nm | <5% |
25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm 300mm | P(Boron) N(Phos/As/Sb) | <100> <111> or special orientation | 100um+/-20 200um+/- 20 customization | 0.0001 - 200 Ohm-cm /Customization | Cu | <100nm 100nm - 300nm >1000nm | <5% | |
25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm 300mm | P(Boron) N(Phos/As/Sb) | <100> <111> or special orientation | 100um+/-20 200um+/- 20 customization | 0.0001 - 200 Ohm-cm /Customization | Ag | <100nm 100nm - 300nm >1000nm | <5% | |
25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm 300mm | P(Boron) N(Phos/As/Sb) | <100> <111> or special orientation | 100um+/-20 200um+/- 20 customization | 0.0001 - 200 Ohm-cm /Customization | Ti | <100nm 100nm - 300nm >1000nm | <5% | |
单晶蓝宝石晶片 | 25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm | C A M R or special orientation |
1000um 2000um customization |
|
GaN | 500nm Customization | <5% | |
25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm | C A M R or special orientation | 1000um 2000um customization | AlN | <100nm 300nm >1000nm | <5% | |||
25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm | C A M R or special orientation | 1000um 2000um customization | AlInN | <100nm 300nm >1000nm | <5% | |||
25.4mm 50.8mm 76.5mm 100mm 125mm 150mm 200mm | C A M R or special orientation | 1000um 2000um customization | Al | <100nm 300nm >1000nm | <5% | |||
25.4mm 50.8mm 76.5mm | P(Boron) N(Phos/As/Sb) | <100> <111> or special orientation |
400um+/-20 400um+/- 20 400um+/-20 | 0.0001 - 200 Ohm-cm /Customization |
GaN | <100nm 300nm >1000nm | TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um | |
100mm 125mm 150mm | P(Boron) N(Phos/As/Sb) | <100> <111> or special orientation | 525um+/-20 625um+/-20 625um+/-20 | 0.0001 - 200 Ohm-cm /Customization | GaN | <100nm 300nm >1000nm | TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um | |
200mm | P(Boron) N(Phos/As/Sb) | <100> <111> or special orientation | 725um+/-20 | 0.0001 - 200 Ohm-cm /Customization | GaN | <100nm 300nm >1000nm | TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um | |
300mm | P(Boron) N(Phos/As/Sb) | <100> <111> or special orientation | 775um+/-20 | 0.0001 - 200 Ohm-cm /Customization | GaN | <100nm 300nm >1000nm | TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um | |
单晶砷化镓抛光晶片 | 50.8mm 76.5mm | AL | ||||||
100mm 125mm | Cu | |||||||
150mm | Au | |||||||